发明名称 PATTERN DRAWING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To make quickly, efficiently and accurately formable a pattern according to the scanning speed characteristic of a beam. <P>SOLUTION: The pattern drawing device is so composed that a scanning line is previously divided into small intersections, the time intervals necessary for scanning the small intersections with a beam are successively detected on the basis of a scale signal generated from a monitor beam, a series of pulse data for drawing are previously stored in a memory to match the values of the time intervals, and a pulse data selection part 94 successively selects the corresponding pulse data on the basis of the detected time intervals. Further, a pulse signal generation part 96 successively generates control pulse signals on the basis of the selected pulse data, raster data to be drawn are synchronously controlled on the basis of the generated pulse signals, and a laser beam is ON/OFF modulated. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004333618(A) 申请公布日期 2004.11.25
申请号 JP20030126309 申请日期 2003.05.01
申请人 PENTAX CORP 发明人 OKUYAMA TAKASHI
分类号 G02B26/10;G03B27/42;G03F7/20;G03F7/207;G06K7/10;H01J3/14;H04N1/10;H04N1/113;H05K3/00 主分类号 G02B26/10
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