| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the prediction accuracy by selecting the data usable for prediction based on the result of a multivariate analysis. <P>SOLUTION: Operating data and treatment result data such as upper electrode thickness obtained for each wafer treatment are collected in an operating data memory 202 and in a treatment result data memory 204. Data usable for prediction are selected based on the result of a multivariate analysis conducted for the collected operating data by an analysis section 208, and the correlation between the selected operating data and treatment result data is determined. Based on the determined correlation, and by using the operating data for the treatment of wafers other that on which the correlation has been obtained, the state of the plasma treatment apparatus or that of the object of treatment are predicted as the results of treatment. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
