发明名称 POLARIZATION-OPTIMIZED AXICON SYSTEM, AND AN ILLUMINATING SYSTEM FOR MICROLITHOGRAPHIC PROJECTION SYSTEM HAVING SUCH AN AXICON SYSTEM
摘要 <p>An axicon system (250) which can be used, for example, in an illuminating system for a microlithographic projection exposure apparatus serves the purpose of transforming an entrance light distribution striking its entrance surface (255) into an exit light distribution emerging from its exit surface (258) by radial redistribution of light intensity. It has an optical axis (3), a first axicon element (251) with a first axicon surface (255), and at least one second axicon element (252) with a second axicon surface (258). Furthermore, at least one intermediate surface (256, 257) arranged between the first and the second axicon surface is provided which can likewise be designed as an axicon surface, for example. The distribution of the axicon functionality over a plurality of surfaces permits the design of polarization-maintaining axicon systems.</p>
申请公布号 WO2004102230(A1) 申请公布日期 2004.11.25
申请号 WO2003EP09613 申请日期 2003.08.29
申请人 CARL ZEISS SMT AG;FUERTER, GERHARD;SINGER, WOLFGANG;MAUL, MANFRED;KOHL, ALEXANDER;FIOLKA, DAMIAN 发明人 FUERTER, GERHARD;SINGER, WOLFGANG;MAUL, MANFRED;KOHL, ALEXANDER;FIOLKA, DAMIAN
分类号 G02B5/00;G02B27/09;G03F7/20;(IPC1-7):G02B5/00 主分类号 G02B5/00
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