FILM PATTERN FORMING METHOD, DEVICE, DEVICE MANUFACTURING METHOD, ELECTROOPTICAL DEVICE AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a film pattern forming method capable of forming film patterns having various shapes with a high treatment capacity. SOLUTION: This film pattern forming method has a process for forming a bank B on a board P and a process for allowing liquid droplets of a functional liquid L to impinge against the board P to arrange the functional liquid L on a demarcated region A demarcated by the bank B and satisfies the following conditions, that is, (a) the surface of the board P in the demarcated region A is lower than that of the bank B in the contact angle with the functional liquid L and (b) at least a part of the liquid droplets comes into contact with the board P in the demarcated region A at the time of impingement of the liquid droplets. COPYRIGHT: (C)2005,JPO&NCIPI