发明名称 |
EXHAUST GAS TREATMENT APPARATUS AND EXHAUST GAS TREATMENT METHOD USING THE SAME |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exhaust gas treatment apparatus that can appropriately control growth of a solid material adhering to the inside wall of an inlet pipe in exhaust gas treatment. <P>SOLUTION: The exhaust gas treatment apparatus X1 is characterized by comprising an inlet pipe 11 having an open bottom end 11a and an exhaust gas inlet 11b situated above said open bottom end 11a, a rotary impeller 12 installed below the open bottom end 11a of the inlet pipe 11 that can rotate to generate reduced pressure in the inlet pipe 11 and a rotator 13 installed above the open bottom end 11a and below the exhaust gas inlet 11b in the inlet pipe 11. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2004330123(A) |
申请公布日期 |
2004.11.25 |
申请号 |
JP20030131230 |
申请日期 |
2003.05.09 |
申请人 |
SUMITOMO SEIKA CHEM CO LTD |
发明人 |
TAKADA YOSHINORI;HOSONAKA KENZO |
分类号 |
B01D53/70;B01D53/14;B01D53/77;H01L21/3065;(IPC1-7):B01D53/70;H01L21/306 |
主分类号 |
B01D53/70 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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