METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, METHOD FOR MANUFACTURING REFLECTIVE MASK AND METHOD FOR MANUFACTURING SUBSTRATE WITH REFLECTIVE MULTILAYER FILM

摘要

PROBLEM TO BE SOLVED: To provide a means to effectively decrease stress in a reflective multilayer film formed on a substrate without impairing the reflectance.

SOLUTION: The method for manufacturing a reflective mask blank and a reflective mask includes a process of forming a reflective multilayer film 2 including the steps of: forming a first material layer constituting the reflective multilayer film 2 on a substrate 1; supplying at least one kind of the gases of elements or compounds having two or more unpaired electrons in the atomic state onto the surface of the first material layer; and depositing a second material layer constituting the reflective multilayer film 2 on the first material layer.

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