发明名称 PLATING METHOD, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT
摘要 PROBLEM TO BE SOLVED: To suppress sticking between parts to be plated and variation in a plating film in a plating method using a vibration plating device. SOLUTION: Plating is performed in such a manner that a flowing state where the contents of a container 30 flow mainly to the horizontal direction with a vibration transmission part 40 as the center and another flowing state where the contents flow mainly to the vertical direction are alternately repeated by periodically changing the frequency of the vibration generated in a vibration generating part 10. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004332040(A) 申请公布日期 2004.11.25
申请号 JP20030128664 申请日期 2003.05.07
申请人 MURATA MFG CO LTD 发明人 MOTOKI AKIHIRO;KURODA SHIGEYUKI
分类号 C25D21/10;H01G4/12;H01G4/30;(IPC1-7):C25D21/10 主分类号 C25D21/10
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