发明名称 GAPFILL PROCESS USING A COMBINATION OF SPIN-ON-GLASS DEPOSITION AND CHEMICAL VAPOR DEPOSITION TECHNIQUES
摘要 A method of filling a plurality of trenches etched in a substrate. In one embodiment the method includes depositing a layer of spin-on glass material over the substrate and into the plurality of trenches; exposing the layer of spin-on glass material to a solvent; curing the layer of spin-on glass material; and depositing a layer of silica glass over the cured spin-on glass layer using a chemical vapor deposition technique.
申请公布号 WO2004101840(A1) 申请公布日期 2004.11.25
申请号 WO2004US02850 申请日期 2004.01.30
申请人 APPLIED MATERIALS INC.;CUI, ZHENJIANG;ROBERTS, RICK, J.;COX, MICHAEL, S.;ZHAO, JUN 发明人 CUI, ZHENJIANG;ROBERTS, RICK, J.;COX, MICHAEL, S.;ZHAO, JUN
分类号 H01L21/762;H01L21/768 主分类号 H01L21/762
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