| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning member which is less prone to generate contamination of an apparatus caused by a silicone of a cleaning layer in the case of cleaning foreign matters in the apparatus transferred into a base treating device. SOLUTION: In a cleaning sheet, relative strengths (a positive ion is a C<SB>2</SB>H<SB>3</SB><SP>+</SP>ratio, and a negative ion is an O<SP>-</SP>ratio) of a fragment ion of CH<SB>3</SB>Si<SP>+</SP>, C<SB>3</SB>H<SB>9</SB>Si<SP>+</SP>, C<SB>5</SB>H<SB>15</SB>Si<SB>2</SB>O<SP>+</SP>, C<SB>5</SB>H<SB>15</SB>Si<SB>3</SB>O<SB>3</SB><SP>+</SP>, C<SB>7</SB>H<SB>21</SB>Si<SB>3</SB>O<SB>2</SB><SP>+</SP>, CH<SB>3</SB>SiO<SP>-</SP>, CH<SB>3</SB>SiO<SB>2</SB><SP>-</SP>, and Si<SP>+</SP>of the cleaning layer are 0.1 or less respectively in a time-of-flight type secondary ion mass spectrometry. A transfer member with a cleaning function has at least the cleaning layer on one surface thereof. COPYRIGHT: (C)2005,JPO&NCIPI
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