发明名称 Projection optical system, exposure apparatus, and device manufacturing method
摘要 A projection optical system for projecting an image of a first object onto a second object includes a first imaging optical system that forms a first intermediate image of the first object, and includes a lens, a second imaging optical system that forms a second intermediate image of the first object, and includes a lens and a concave mirror, and a third imaging optical system that forms an image of the first object onto the second object, and includes a lens, wherein the first, second and third imaging optical systems are arranged along an optical path from the first object in this order, and 0.7<|beta1.beta2<<3.0 is met where beta1 is a paraxial magnification of the first imaging optical system, and beta2 is a paraxial magnification of the second imaging optical system.
申请公布号 US2004233405(A1) 申请公布日期 2004.11.25
申请号 US20040851869 申请日期 2004.05.21
申请人 KATO TAKASHI;TERASAWA CHIAKI 发明人 KATO TAKASHI;TERASAWA CHIAKI
分类号 G02B13/14;G02B17/08;G03F7/20;(IPC1-7):G03B27/54 主分类号 G02B13/14
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