| 摘要 |
The invention relates to a diffraction element which comprises a carrier (14) and a plurality of diffractive structures (16; 216) disposed thereon that are binary blazed by a subdivision into substructures (181, 182, 183, 184) so that the aspect ratio of the substructures (181, 182, 183, 184) locally varies within an individual diffractive structure. Within an individual diffractive structure (16; 216) one or more high aspect ratio substructures (185, 186, 187) are replaced by at least one substituent structure (20; 20a; 20b; 120; 220) whose aspect ratio is smaller than that of the replaced substructures (185, 186, 187). The diffraction grating (10; 100; 200) is characterized by a high diffraction efficiency and comprises no high aspect ratio substructures that are difficult to produce. |
