A METHOD FOR MANUFACTURING OF MICROELECTROMECHANICAL SWITCH

摘要

Invention relates to a class of microelectromechanical systems (MEMS), to be more precise to the manufacturing technology of microelectromechanical switches. Seeking to increase reliability and durability of microelectromechanical switches, fabrication method of microelectromechanical switch starts from formation of microstructures in the support area (7) of microcantilever structure (5) by patterning and etching, using a combination of wet and reactive ion etching processes, a layer of deposited aluminium. Further, source (2), gate (3) and drain (4) electrodes are formed on the substrate (1) by deposition of chrome under layer by electron - beam evaporation and subsequent resistive evaporation of gold layer a top of the chrome layer, following pattering of the electrodes using lift - off lithography. Next, electron - beam evaporation is used to deposit a sacrificial copper layer over the whole area of the substrate (1). Then pattering of the copper is partially etched to define thecontact tips (6)