METHOD OF MANUFACTURING XENON DIFLUORIDE

摘要

PROBLEM TO BE SOLVED: To provide a method of efficiently manufacturing xenon difluoride used as an isotropic etching gas for semiconductor manufacture in an electronic field. SOLUTION: Xenon and fluorine are reacted with each other using a reactor having a cooling solidifying instrument. As a catalyst, nickel fluoride or cobalt fluoride is used. COPYRIGHT: (C)2005,JPO&NCIPI