| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner, an exposing method, and a manufacturing method and an exposure program of a semiconductor device capable of properly taking into account the size at exposure this time in the case of determining the exposure amount in the succeeding exposure. SOLUTION: An exposure amount calculation means 4 calculates an exposure amount of a lot this time on the basis of the size of a preceding lot when the size of the preceding lot entered from a size entry means 2 is within a specified range, and calculates the exposure amount this time on the basis of the size of a lot preceding to the preceding lot when the size of the preceding lot entered from the size entry means 2 is not within a specified range. COPYRIGHT: (C)2005,JPO&NCIPI
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