| 摘要 |
An apparatus and method for generating a trajectory used in precision lithography, includes receiving first input parameters for a first trajectory and second input parameters for a second trajectory, converting the first input parameters of the first trajectory into a first derivative-jerk and the second input parameters of the second trajectory into a second derivative-jerk. The first and second derivative-jerk are arranged with the first derivative-jerk overlapping the second derivative-jerk by a time interval, and then combining the first derivative-jerk and the second derivative-jerk together into a third derivative-jerk using a shorter period of time compared with the time to finish the combination of the first derivative-jerk and the second derivative-jerk.
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