SUBSTRATE PROCESSING EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide substrate processing equipment capable of clean processing of a substrate. SOLUTION: The substrate processing equipment 10A employing microwave plasma is provided with an internal partition wall 15 in a processing vessel 11. Interior of the processing vessel 11 is separated into a space 11A including a substrate to be processed, and a space 11B being defined by the internal partition wall 15 and the outer wall of the processing vessel 11. COPYRIGHT: (C)2005,JPO&NCIPI