发明名称 SEMICONDUCTOR SUBSTRATE AND ITS PRODUCING PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a process for producing a semiconductor substrate having a gallium arsenide layer. SOLUTION: A gallium arsenide substrate 40 is produced through a step for producing a first substrate 10 having a germanium substrate 11, a gallium arsenide layer 12 arranged on the germanium substrate 11, and an ion implantation layer 13 formed on at least any one of the germanium substrate 11 and the gallium arsenide layer 12, a step for producing a substrate 30 by bonding the first substrate 10 and a second substrate 20, and a step for dividing the bonded substrate 30 at the part of the ion implantation layer 13. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004335693(A) 申请公布日期 2004.11.25
申请号 JP20030128917 申请日期 2003.05.07
申请人 CANON INC 发明人 YONEHARA TAKAO
分类号 H01L21/20;H01L21/02;H01L21/762;H01L27/12;(IPC1-7):H01L21/02 主分类号 H01L21/20
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