发明名称 COATER, SYSTEM FOR FORMING THIN FILM, PROCESS FOR FABRICATING SEMICONDUCTOR DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a coater, and a thin film forming system in which maintenance can be carried out efficiently and a thin film can be formed with higher safety, and to provide a process for fabricating a semiconductor device, an electro-optical device and an electronic apparatus. SOLUTION: The coater for coating a substrate W with a liquid material in a coating chamber 40 comprises a liquid material supply system 50 for supplying liquid material to the coating chamber 40. The liquid supply system 50 is provided with a container 51 for storing the liquid material, a nozzle section 53 for ejecting the liquid material introduced from the container, and a piping group consisting of piping 65 leading to the upstream side of the container 51 and piping 56 interconnecting the container 51 and the nozzle section 53. The container 51 is fixed removably to the piping group. The piping group fixed with the container 51 is provided with purge mechanisms 47 and 54 for introducing purge gas into the pipe group. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004335572(A) 申请公布日期 2004.11.25
申请号 JP20030126318 申请日期 2003.05.01
申请人 SEIKO EPSON CORP 发明人 YUDASAKA KAZUO
分类号 B05C11/10;H01L21/208;H01L21/288;H01L21/31;H01L21/3205;H01L21/336;H01L21/768;H01L29/786;(IPC1-7):H01L21/208;H01L21/320 主分类号 B05C11/10
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