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发明名称
Charged-particle multi-beam exposure apparatus
摘要
申请公布号
GB0423152(D0)
申请公布日期
2004.11.24
申请号
GB20040023152
申请日期
2004.10.18
申请人
IMS NANOFABRICATION GMBH
发明人
分类号
G03F7/20;H01J37/317;H01L21/027
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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