METHOD OF TREATING SURFACE, SEMICONDUCTOR DEVICE, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND APPARATUS FOR TREATMENT

摘要

A surface treatment method of treating a surface having structural bodies formed thereon using a supercritical fluid (4) is characterized in adding a co-solvent or a reactant (5) such as ammonium hydroxide, alkanolamine, amine fluoride, hydrofluoric acid and so forth to the supercritical fluid (4) . The supercritical fluid (4) may also be added with a surfactant (6) together with the co-solvent or the reactant (5). It is allowable to use a polar solvent as the surfactant (6). <??>This makes it possible to provide a surface treatment method capable of thoroughly removing the residue only by a treatment using the supercritical fluid. <IMAGE>