| 摘要 |
The present invention relates to an exhaust gas purifying apparatus comprising a plasma reactor containing at least one of a H2O adsorbent and a HC adsorbent; and a NOx adsorbent located downstream of said plasma reactor. Further, the present invention relates to an exhaust gas purifying apparatus comprising a plasma reactor containing at least one of a H2O adsorbent and a HC adsorbent, and a NOx adsorbent. Still further, the present invention relates to a method using the present apparatus. According to the present apparatus, by generating plasma in the plasma reactor, H2O trapped on the H2O adsorbent is activated to be a strong oxidant such as OH radical and O radical, and HC trapped on the HC adsorbent is activated to be radicals, lower HCs, etc. <IMAGE>
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