| 摘要 |
FIELD: glass industry. ^ SUBSTANCE: proposed etching solution contains the following components: HF, HNO3, NH4F, H2O and additionally it contains glycerin CH2OHCHOHCH2OH at the following ratio of components, mass-%: HF, 20.0-24.0; HNO3, 12.0-16.0; NH4F, 14.0-18.0; CH2OHCHOHCH2OH, 0.5-1.5; the remainder being H2O. ^ EFFECT: increased depth of etching glass with no distortion in pattern. ^ 1 tbl |
