发明名称 |
Method and apparatus for creating a phase-shifting mask for a photolithographic process |
摘要 |
One embodiment of the invention provides a system that creates a phase-shifting mask for a photolithographic process used in fabricating an integrated circuit. The system starts by receiving a layout for the integrated circuit. The system then associates nodes with features in the layout, and generates arcs between the nodes. Next, the system generates a coloring for the nodes using two colors. The system then generates phase shifters for the phase-shifting mask and assigns different phases to the phase shifters based upon the coloring of the nodes.
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申请公布号 |
US6823503(B2) |
申请公布日期 |
2004.11.23 |
申请号 |
US20020334566 |
申请日期 |
2002.12.31 |
申请人 |
NUMERICAL TECHNOLOGIES, INC. |
发明人 |
BEAUDETTE KEVIN A. |
分类号 |
G03F1/00;G06F17/50;(IPC1-7):G06F17/50 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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