发明名称 Method of manufacturing electron-emitting device, electron source and image-forming apparatus
摘要 An electron-emitting device having an electroconductive film including an electron-emitting region arranged between a pair of device electrodes is manufactured. The electroconductive film is formed by applying a liquid containing the material of the film to a substrate by using an ink-jet method, then drying and heating the applied liquid. Defective conditions, if any, in the applied liquid or the precursor film formed by drying the liquid or the electroconductive film formed by heating the precursor film are detected and remedied by applying the same liquid again to the area detected for a defective condition. The detection and remedy of any defective condition may be conducted after the liquid-applying, drying or baking step.
申请公布号 US6821551(B2) 申请公布日期 2004.11.23
申请号 US20010966595 申请日期 2001.10.01
申请人 CANON KABUSHIKI KAISHA 发明人 HASEGAWA MITSUTOSHI
分类号 H01J1/30;H01J9/02;(IPC1-7):B05D3/02;B05D5/12 主分类号 H01J1/30
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