发明名称 Method for separating two elements and a device therefor
摘要 A process and device for separating two semi-conductor substrate wafers along an interface. The process includes forming a cavity, and initiating separation by applying force to the interface through the cavity. The device utilizes fluid or gas, and pressure chambers, to subject adherent faces of the interface to at least one of chemical or mechanical action.
申请公布号 US6821376(B1) 申请公布日期 2004.11.23
申请号 US20020030272 申请日期 2002.01.08
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 RAYSSAC OLIVIER;MORICEAU HUBERT;ASPAR BERNARD;MONTMAYEUL PHILIPPE
分类号 H01L21/683;H01L21/00;H01L21/02;H01L27/12;(IPC1-7):B32B35/00 主分类号 H01L21/683
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