发明名称 |
Compositions for removing etching residue and use thereof |
摘要 |
A composition for removing etching residue and a method using same are disclosed herein. In one aspect, there is provided a method for removing etching residue from a substrate comprising: contacting the substrate with a composition comprising water, an organic dicarboxylic acid, a buffering agent, a fluorine source, and optionally a water miscible organic solvent.
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申请公布号 |
US6821352(B2) |
申请公布日期 |
2004.11.23 |
申请号 |
US20030723737 |
申请日期 |
2003.11.26 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
ROVITO ROBERTO JOHN;RENNIE DAVID BARRY;DURHAM DANA L. |
分类号 |
C11D7/04;C09K13/00;C11D7/26;C11D7/50;C23G5/024;H01L21/02;H01L21/304;H01L21/306;H01L21/311;H01L21/3213;(IPC1-7):C23G1/02 |
主分类号 |
C11D7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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