| 摘要 |
A method for fabricating slurry for a CMP process is provided to avoid malfunction of a storage tank, a filter and a transfer pump and excessive preventive maintenance by preventing large slurry particles from being left in the storage tank by a transfer pipe that is fabricated in a manner that ground slurry can be scattered and diluted during a transfer process. Slurry including deionized water and a polishing agent is fabricated and mixed. The mixed slurry is ground. The ground slurry is transferred to a storage tank part(210) wherein deionized water is added to dilute the ground slurry so that the slurry has a predetermined content of a polishing agent. Additive including a pH(hydrogen ion concentration) adjust agent and a polishing acceleration agent is mixed with the slurry diluted and transferred to the storage tank part. The additive-mixed slurry is filtered to obtain slurry having a desired size or less. The filtered slurry can be stored in a secondary storage tank part(216), and the slurry stored in the secondary storage tank part can be filtered again to obtain slurry having a predetermined size or less.
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