发明名称 WAFER SUPPORT PART OF WET CLEANING EQUIPMENT AND CLEANING SYSTEM USING THE SAME
摘要 PURPOSE: A wafer support part of wet cleaning equipment and a cleaning system using the same are provided to reduce the damage of wafers by checking quickly the absence of some wafers using sensor blocks while cleaning the wafers. CONSTITUTION: A wafer support part of wet cleaning equipment includes a rectangular panel shaped body, support slots, sensor blocks, and a controller. The support slots(52) are formed on the body corresponding to a wafer array direction of a cassette. The sensor blocks for detecting wafers are inserted in grooves of the support slots. The controller is used for controlling the cleaning equipment according to sensing signals of the sensor blocks. Each sensor block includes a light emitting sensor(56a) and a light receiving sensor(56b).
申请公布号 KR20040098096(A) 申请公布日期 2004.11.20
申请号 KR20030030165 申请日期 2003.05.13
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, WON IL
分类号 H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/304
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