| 摘要 |
PURPOSE: An ion-implantation apparatus for a large substrate is provided to minimize the necessary space for an ion-implantation by moving the substrate to and fro using the first motor and to prevent the deformation of the substrate by tilting a substrate transfer carrier as much as desired degrees using the second motor. CONSTITUTION: An ion-implantation apparatus includes an ion generator(10), an ion accelerator(20), an ion separation part(30), and an ion implantation part. The ion implantation part(40) includes a substrate inlet part(41), a process part, and a substrate outlet part(43). The process part(42) holds a substrate transfer carrier(45). The process part is used for performing an ion-implantation on a substrate of the substrate transfer carrier. The carrier is moved to and fro by using the first motor(46) for linear-motion. The carrier is rotated as much as 45 to 87 degrees by using the second motor(47) for rotation.
|
