发明名称 ETHYNYL COMPOUND
摘要 PROBLEM TO BE SOLVED: To provide an ethynyl compound having high heat resistance. SOLUTION: A compound represented by formula (1) is disclosed. It is desirable that Ar in the compound represented by formula (1) is a residue derived by removing n<SB>1</SB>hydrogen atoms from a benzene ring. That is to say, the compound represented by formula (1) is a compound represented by formula (2). In formulae (1) and (2), Ar is an n<SB>1</SB>-valent aryl group; n<SB>1</SB>is an integer of 2-4; and n<SB>2</SB>is an integer of 1 or 2. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008222690(A) 申请公布日期 2008.09.25
申请号 JP20070067917 申请日期 2007.03.16
申请人 FUJIFILM CORP 发明人 KUBO YOHEI;IWATO KAORU
分类号 C07C233/65 主分类号 C07C233/65
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