发明名称
摘要 A process for producing a purified aqueous hydrogen peroxide solution comprising bringing an aqueous hydrogen peroxide solution containing impurities into contact with an anion exchange resin in the fluoride form is disclosed. According to the process, impurities in the aqueous hydrogen peroxide solution, particularly impurities containing silicon, such as silicates and silicic acid, can efficiently be removed, and a purified aqueous hydrogen peroxide solution having a high purity can be obtained.
申请公布号 KR100450558(B1) 申请公布日期 2004.11.20
申请号 KR19960049986 申请日期 1996.10.30
申请人 发明人
分类号 C01B15/013;B01J41/04;B01J41/12;C01B15/023 主分类号 C01B15/013
代理机构 代理人
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