MANUFACTURING PROCESS CONTROL METHOD FOR SEMICONDUCTOR DEVICE, AND MANUFACTURE PROCESS CONTROL APPARATUS FOR THE SEMICONDUCTOR DEVICE,申请号JP20030121370-传众专利搜索

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发明名称	MANUFACTURING PROCESS CONTROL METHOD FOR SEMICONDUCTOR DEVICE, AND MANUFACTURE PROCESS CONTROL APPARATUS FOR THE SEMICONDUCTOR DEVICE
摘要	<p><P>PROBLEM TO BE SOLVED: To properly control the manufacturing process of semiconductor devices. <P>SOLUTION: A distribution ratio m of a feedforward control to feedback control is changed with respect to the via-forming process of a semiconductor device A, to obtain the distribution ratio m so that its process capability index Cp is maximized. The feedforward control and the feedback control are combined by the distribution ratio m, to obtain a correction amount of the alignment for an exposure apparatus in the via-forming process. Since a proper correction amount is obtainable in this way, and an effect higher than that in the case of singly using respective one of the feedforward control and the feedback control can be obtained, the semiconductor device A with high quality can be manufactured stably. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号	JP2004327778(A)	申请公布日期	2004.11.18
申请号	JP20030121370	申请日期	2003.04.25
申请人	FASL JAPAN LTD	发明人	MURAKAMI KENICHI
分类号	G03F7/20;H01L21/02;H01L21/027;(IPC1-7):H01L21/02	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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