| 摘要 |
It is possible to decrease block segmentation and flickering due to separate exposure in an active matrix substrate while avoiding decreased aperture ratio, increased parasitic capacity and complication in manufacturing process. A first pixel circuit and a second pixel circuit including a first-type TFT and a second-type TFT, respectively, are disposed alternately relative to each other in both directions of row and column in an active matrix substrate. In the first-type and the second-type TFTs, a pattern misalignment of the drain electrode with respect to the gate electrode in an up-down direction will increase/decrease a gate-drain parasitic capacity Cgd in reverse ways. By disposing these two types of TFTs in uniform dispersion, the increase/decrease in the parasitic capacity Cgd caused by pattern misalignment occurring at the time of manufacture are averaged.
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