| 摘要 |
PROBLEM TO BE SOLVED: To improve the throughput of a cleaning device for cleaning a chuck to reduce the amount of a consumed gas and improve a cleaning performance. SOLUTION: The cleaning device WA comprises cleaning baths 10, jet nozzles 11, delivery nozzles 12, a liquid supply mechanism 13, and a gas supply mechanism 14. The liquid supply mechanism 13 has a supply tank 130, a heating device 131, and a liquid delivery mechanism 133. In the liquid supply mechanism 13, pure water of a room temperature supplied from the supply tank 131 is heated by the heating device 131 to produce warm water HLQ (with lowered electric resistance) which is heated above the room temperature. The warm water HLQ is then supplied to the cleaning baths 10 via the liquid delivery mechanism 133. A lifting mechanism lowers a transfer arm 20 to submerge the chuck 21 in the warm water HLQ to clean it. COPYRIGHT: (C)2005,JPO&NCIPI
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