Process for the plasma-activated high rate vaporization of a large surface substrate in a vacuum comprises producing a magnetic field diverging in the direction of the substrate, and further processing

摘要

Process for the plasma-activated high rate vaporization of a large surface substrate in a vacuum comprises producing a magnetic field (14) diverging in the direction of the substrate (1) between a vaporization unit and the substrate, producing a high energy plasma between the vaporization unit (3) and the substrate, vaporizing a vaporizing material using a high energetic electron beam having energies of 10-100 keV, partially ionizing the vapor with the plasma, and accelerating the ions in the direction of the substrate in the region of the magnetic field. An independent claim is also included for a vacuum coating installation for carrying out the process.