NANOPARTICLE POLYMER FOR RESIST COMPRISING RANDOM COPOLYMER OF TWO, THREE OR FOUR KINDS OF MONOMERS TO IMPROVE LINE-EDGE ROUGHNESS

摘要

PURPOSE: A nanoparticle polymer for resist is provided, to obtain a resist having a pattern of micro-width from submicrometers to several tens nm, to improve line-edge roughness and to increase etching resistance. CONSTITUTION: The nanoparticle polymer is crosslinked from a random copolymer of two, three or four kinds of monomers and is represented by the formula 1, wherein a monomer capable of being used as an acid-labile monomer is represented by the formula 2 and a monomer capable of being used as an adhesion monomer is represented by the formula 6. In the formula 2, R is an alkyl group, an aryl group or other groups, and X is an arbitrary substituent; and in the formula 6, Y is H or a C1-C3 linear or branched alkyl group; and R66 is a C0-C5 linear, branched or cyclic alkyl group.