FINE SHAPE FORMING METHOD, RESIST PATTERN SHAPE DESIGNING METHOD AND DEVICE, PROGRAM FOR DESIGNING RESIST PATTERN SHAPE, STORAGE MEDIUM FOR DESIGNING RESIST PATTERN SHAPE, RESIST PATTERN, AND FINE SHAPE PATTERN

摘要

PROBLEM TO BE SOLVED: To accurately form various kinds of aimed three-dimensional fine shape in process for transferring a photoresist pattern where the three-dimensional fine shape is formed to a ground base plate by dry etching.

SOLUTION: The resist pattern shape designing method includes a condition setting stage (S1) for setting an etching condition, a shape change measuring stage (S2) for measuring the shape change of a test pattern by etching the test pattern on the set etching condition, an extracting stage (S3) for extracting a shape change parameter based on the shape change of the measured test pattern and a designing stage (S4) for designing the shape of the photoresist pattern in accordance with the extracted shape change parameter. By designing so that the shape of the photoresist pattern may be deformed to the shape obtained by previously taking in the portion of deformation at the time of etching, the shape according to a design value is formed by the shape after etching, and such complicated operation that a selectivity ratio is changed in the midst of etching is not required.

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