Reducing charging effects in photolithography reticle manufacturing

摘要

Reticle charging effects during the manufacturing process may be reduced. A reticle, including a peripheral outer region and a central inner conductive region separated by an intervening non-conductive region, may be electrically coupled to reduce differential charge effects in one embodiment. For example, a conductive bridge may be formed between the inner and outer regions to electrically neutralize any charge distribution.