NANOLAYER DEPOSITION PROCESS

摘要

A hybrid deposition process of CVD and ALD, called NanoLayer Deposition ("NLD") is provided. The NLD process is a cyclic deposition process, comprising the first step (40) of introducing a first plurality of precursors to deposit a thin film with the deposition process not self-limiting, then a second step (41) of purging the first set of precursors and a third step (42) of introducing a second plurality of precursors to modify the deposited thin film. The deposition step in NLD is not self-limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already-deposited film characteristics. The second set of precursors can treat the deposited film such as modification of film composition, a doping, or a removal of impurities. The second set of precursors can also deposit another film. The additional layer can react with the existing layer to form a compound layer, or can minimally react to form a nanolaminate film.