发明名称 |
HIGH PRESSURE PROCESSING CHAMBER FOR MULTIPLE SEMICONDUCTOR SUBSTRATES |
摘要 |
A high pressure processing chamber for processing multiple semiconductor substrates I comprises a chamber housing, a cassette, and a chamber closure. The cassette is removably coupled to the chamber housing. The cassette is configured to accommodate at least two semiconductor substrates. The chamber closure is coupled to the chamber housing. The chamber closure is configured such that in operation the chamber closure seals with the chamber housing to provide an enclosure for high pressure processing of the semicon ductor substrates. |
申请公布号 |
WO03030219(A3) |
申请公布日期 |
2004.11.18 |
申请号 |
WO2002US31710 |
申请日期 |
2002.10.03 |
申请人 |
SUPERCRITICAL SYSTEMS INC. |
发明人 |
BIBERGER, MAXIMILIAN, A.;LAYMAN, FREDERICK, P. |
分类号 |
H01L21/304;B08B7/00;H01L21/00;H01L21/673;(IPC1-7):C23C16/00 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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