| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive element capable of ensuring satisfactory sensitivity and resolution and capable of obtaining a good resist shape, when light having a wavelength of 400-450 nm is used as exposure light. SOLUTION: The photosensitive element comprises a support film X and a photosensitive resin composition layer Z. A photosensitive resin composition as the material of the layer Z contains a binder polymer A, a photopolymerizable compound B having at least one polymerizable ethylenically unsaturated bond and a photopolymerization initiator C, wherein at least a 4,4'-bis(dialkylamino)benzophenone and/or a 4,4'-bis(alkylamino)benzophenone is contained as a constituent in the initiator C, and a thickness Q [μm] of the layer Z, gross mass Wa [g] of the polymer A in the layer Z, gross mass Wb [g] of the compound B in the layer Z and mass Wc [g] of the above benzophenone in the layer Z are regulated so as to simultaneously satisfy conditions represented by the expressions (1): P=äWc/(Wa+Wb)}×100, (2): P×Q=R, (3): 6.5≤R≤17.5. COPYRIGHT: (C)2005,JPO&NCIPI
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