发明名称 SUSCEPTOR FOR EPITAXIAL GROWTH
摘要 PROBLEM TO BE SOLVED: To prevent sticking phenomenon between a wafer and a susceptor in the horizontal disk-shape susceptor for horizontally holding the wafer for conducting epitaxial growth. SOLUTION: A concave portion 7 for horizontally housing the wafer 8 is provided on the top surface of the susceptor 3. A convex portion 9 is provided at the bottom external peripheral portion of the concave portion 7. The convex portion 9 is formed, by making a bottom surface 10 of the concave portion 7 protrude upwardly from the inner peripheral side and the height is 0.2-0.4 times the thickness of the wafer 8. When the wafer 8 slides from a regular position in the radial direction, by making the concave portion 7 abut against a tapered surface 12 on the rear side of the external peripheral edge of the wafer 8, the wafer 8 is held near the regular position. By avoiding the situation in which the wafer 8 contacts an internal peripheral surface 11 of the concave portion 7, generation of a bridge which causes sticking can be suppressed. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004327761(A) 申请公布日期 2004.11.18
申请号 JP20030121133 申请日期 2003.04.25
申请人 SUMITOMO MITSUBISHI SILICON CORP 发明人 KOBAYASHI HIDENORI
分类号 C23C16/458;H01L21/205;(IPC1-7):H01L21/205 主分类号 C23C16/458
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