发明名称 METHOD OF MANUFACTURING SUPERCONDUCTING OXIDE THIN FILM DEVICE AND SUPERCONDUCTING OXIDE THIN FILM DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing superconducting oxide thin film device by which a superconducting oxide thin film having a good c-axis orientation can be formed even when buffer layers are formed in thick layers. SOLUTION: A thick CeO<SB>2</SB>first buffer layer 2 contains a (111)-facet, and an Sm<SB>2</SB>O<SB>3</SB>second buffer layer 4 caused to deposit on the first buffer layer 2 is grown as crystal grains smaller than CeO<SB>2</SB>crystal grains by one figure or more. A thin EBCO film 5 is grown on the fine crystal grains. The superconducting thin film composed of such ideal crystal grains has a very high superconductive critial current density (Jc) as well as a very high superconductive critical temperature (Tce). COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004327515(A) 申请公布日期 2004.11.18
申请号 JP20030116537 申请日期 2003.04.22
申请人 JAPAN SCIENCE & TECHNOLOGY AGENCY 发明人 MICHIGAMI OSAMU;HASHIMOTO TAKEO;MICHIGAMI YOKO
分类号 H01L39/24;H01L39/02;(IPC1-7):H01L39/24 主分类号 H01L39/24
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