发明名称 |
METHOD OF MANUFACTURING SUPERCONDUCTING OXIDE THIN FILM DEVICE AND SUPERCONDUCTING OXIDE THIN FILM DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing superconducting oxide thin film device by which a superconducting oxide thin film having a good c-axis orientation can be formed even when buffer layers are formed in thick layers. SOLUTION: A thick CeO<SB>2</SB>first buffer layer 2 contains a (111)-facet, and an Sm<SB>2</SB>O<SB>3</SB>second buffer layer 4 caused to deposit on the first buffer layer 2 is grown as crystal grains smaller than CeO<SB>2</SB>crystal grains by one figure or more. A thin EBCO film 5 is grown on the fine crystal grains. The superconducting thin film composed of such ideal crystal grains has a very high superconductive critial current density (Jc) as well as a very high superconductive critical temperature (Tce). COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004327515(A) |
申请公布日期 |
2004.11.18 |
申请号 |
JP20030116537 |
申请日期 |
2003.04.22 |
申请人 |
JAPAN SCIENCE & TECHNOLOGY AGENCY |
发明人 |
MICHIGAMI OSAMU;HASHIMOTO TAKEO;MICHIGAMI YOKO |
分类号 |
H01L39/24;H01L39/02;(IPC1-7):H01L39/24 |
主分类号 |
H01L39/24 |
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