发明名称 APPARATUS FOR INJECTING PLASMA GAS IN ATMOSPHERE
摘要 <p>An apparatus for injecting plasma in the atmosphere is provided, including a plurality of dielectric panels (13a, 13b, 13c), and 13d, which are disposed in parallel at predetermined intervals, a gas supply portion (14), to which the dielectric panels (13a, 13b, 13c, and 13d) are fixed and which supplies a gas to spaces between the dielectric panels (13a and 13b), between the dielectric panels (13b and 13c), and between the dielectric panels (13c and 13d), power electrodes (15a, 15b, and 15c), which are linearly installed near the gas supply portion (14) and between the dielectric panels (13a and 13b, between the dielectric panels 13b and 13c, and between the dielectric panels 13c and 13d), respectively, ground electrodes (16a, 16b, 16c, and 16d), which are formed in the ends of the dielectric panels (13a, 13b, 13c, and 13d), respectively, and a high frequency generator (17), which applies high frequency power to the power electrodes (15a, 15b, and 15c) and the ground electrodes (16a, 16b, 16c, and 16d).</p>
申请公布号 WO2004100622(A1) 申请公布日期 2004.11.18
申请号 WO2004KR00962 申请日期 2004.04.26
申请人 HANYANG HAK WON CO. LTD.;CHUNG, KYU-SUN;CHOI, YONG-SUP;LEE, MYOUNG-JAE 发明人 CHUNG, KYU-SUN;CHOI, YONG-SUP;LEE, MYOUNG-JAE
分类号 H05H1/24;(IPC1-7):H05H1/18 主分类号 H05H1/24
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