发明名称 |
ELECTROSTATIC ATTRACTION METHOD, ELECTROSTATIC ATTRACTION DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS USING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To perform an electrostatic attraction without generating a distortion even when a sample is warped. SOLUTION: The electrostatic attraction device is composed of a plurality of switches which independently have at least two or more independent electrode groups for controlling an application or a shutdown of a voltage in each electrode of the independent electrode group, a plurality of current detection parts for measuring a current flowing in each electrode of the independent electrode group, and a controller which reads in current information of each electrode of the independent electrode group output from the current detection part. The application or shutdown of the switches provided in each electrode is made in an arbitrary order. COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2004327875(A) |
申请公布日期 |
2004.11.18 |
申请号 |
JP20030123114 |
申请日期 |
2003.04.28 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
OKI KATSUO |
分类号 |
B23Q3/15;H01L21/027;H01L21/68;H01L21/683;H02N13/00;(IPC1-7):H01L21/68 |
主分类号 |
B23Q3/15 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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