发明名称 SUBSTRATE PROCESSING EQUIPMENT AND SUBSTRATE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To simplify the structure while reducing the burden of work on an operator. SOLUTION: The substrate processing equipment is provided with a valve 15 for regulating the open/close state of chemical piping, an encoder 18 and a control section 20. The open/close valve 15 is provided with a motor 151 being controlled according to a control signal from the control section 20, and a diaphragm 154 of a flexible member. The control section 20 controls the rotational direction, rotational speed, and rotational amount (driving position) of the motor 151 depending on the driving position of the motor 151 detected by the encoder 18. More specifically, the motor 151 is controlled automatically such that the diaphragm 154 is shifted slightly in the +Z direction from a position where a cover 154a sticks to a housing 150 when the substrate processing equipment is in stand-by state. Consequently, slow leak of pure water takes place in the substrate processing equipment under stand-by state. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004327788(A) 申请公布日期 2004.11.18
申请号 JP20030121523 申请日期 2003.04.25
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 OGURA HIROYUKI;MATSUI HIROSHI
分类号 B08B3/02;B05C11/08;B05C11/10;B05D1/40;H01L21/027;H01L21/304;(IPC1-7):H01L21/304 主分类号 B08B3/02
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