发明名称 ULTRASONIC CLEANING METHOD AND SEMICONDUCTOR DEVICE PRODUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide an ultrasonic cleaning method having a high removal effect on fine particles. SOLUTION: An object to be cleaned is immersed in a cleaning liquid. The object is cleaned by applying thereto ultrasonic waves under conditions that the sound pressure of the ultrasonic waves propagating in the cleaning liquid is higher then 5 mV and not higher than 50 mV. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004321875(A) 申请公布日期 2004.11.18
申请号 JP20030117012 申请日期 2003.04.22
申请人 FUJITSU LTD 发明人 KAWAMOTO TOMOKAZU
分类号 B08B3/12;H01L21/304;(IPC1-7):B08B3/12 主分类号 B08B3/12
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