| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for measuring a shutter delay caused by difference of the shutter operation of a fully electronic type from the compound shutter operation of an electronic type and an electromechanical type. SOLUTION: A method of measuring the shutter delay includes (a) a step 402 which supposes certain shutter delay time about a shutter 102, (b) a step 404 which performs first photographic exposure by targeting a first target exposure time, (c) a step 406 which calculates the first exposure level of the first photographic exposure, (d) a step 408 which performs a second photographic exposure by targeting a second target exposure time, (e) a step 410 which calculates the second exposure level of the second photographic exposure and (f) a step 412 which calculates an actual shutter delay based on the first target exposure time, the second target exposure time, the first exposure level, the second exposure level and the supposed shutter delay time. COPYRIGHT: (C)2005,JPO&NCIPI |
