| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern drawing apparatus which fast draws a pattern with high accuracy. SOLUTION: The pattern drawing apparatus includes a head unit equipped with a DMD (digital micromirror device) having a micromirror array which draws a pattern on a photosensitive material and modulates reflected light, a stage which holds a substrate, and a mechanism which relatively moves the head unit and the stage. In the pattern drawing apparatus, the substrate is scanned with a group of irradiation regions which correspond to the respective mirrors in the micromirror array of the DMD, in the main scanning direction inclined from the arrangement direction of the irradiation region group to form a pattern, while the irradiation region group is intermittently shifted in the sub scanning direction at a distance shorter than the width of the group in the sub scanning direction so as to draw the pattern all over the substrate. Thereby, even when the distance A of the intermittent shift of the irradiation region group is slightly misaligned, the gap between stripes 71, 72 is properly irradiated with light and the pattern with high accuracy can be drawn at high speed. COPYRIGHT: (C)2005,JPO&NCIPI |
