发明名称 SCANNING PROJECTION ALIGNER, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a scanning projection aligner for forming a device by using an inexpensive mask irrespective of the device size. SOLUTION: In this scanning projection aligner having variable pattern generators 10a-10e for transfer pattern formation, projection optical systems PL1-PL5 for projecting the transfer patterns generated by the various pattern generators 10a-10e upon a photosensitive substrate P, and a substrate stage for scanning the photosensitive substrate P, the variable pattern generators 10a-10e have a controller that varies the transfer patterns generated by the variable pattern generators 10a-10e in synchronization with the scanning of the photosensitive substrate stage P, and the projection optical systems PL1-PL5 have an adjusting mechanism for adjusting the image formed of the transferred patterns. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004327660(A) 申请公布日期 2004.11.18
申请号 JP20030119421 申请日期 2003.04.24
申请人 NIKON CORP 发明人 KOYAMA MOTOO
分类号 G02B13/22;G02B17/08;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02B13/22
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